| 发明名称 |
APPARATUS FOR OPTICAL INSPECTION OF WAFERS DURING POLISHING |
| 摘要 |
A measurement system installable within a processing equipment and more specifically within the exit station of a polishing machine. The optical scheme of this system includes a spectrophotometric channel, an imaging channel and also means for holding the wafer under measurement.
|
| 申请公布号 |
US2008297794(A1) |
申请公布日期 |
2008.12.04 |
| 申请号 |
US20080188624 |
申请日期 |
2008.08.08 |
| 申请人 |
NOVA MEASURING INSTRUMENTS LTD |
发明人 |
FINAROV MOSHE |
| 分类号 |
G01J3/42;B24B37/04;B24B49/12;G01N21/88;H01L21/00;H01L21/304;H01L21/66;H01L21/683 |
主分类号 |
G01J3/42 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
