PLASMA IMMERSION ION PROCESSING FOR COATING OF HOLLOW SUBSTRATES

摘要

The present disclosure relates to an apparatus and method for plasma ion deposition and coating formation. A vacuum chamber may be supplied formed by a hollow substrate having a length, diameter and interior surface. A plasma may be formed within the chamber while applying a negative bias to the hollow substrate to draw ions from the plasma to the interior surface of the hollow substrate to deposit ions onto the interior surface and forming a coating. The coating may have a Vickers Hardness Number (Hv) of at least 500.