| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a compound suitable as an acid generator for a resist composition, the acid generator comprising the compound, the resist composition containing the acid generator and a method for forming a resist pattern by using the resist composition. <P>SOLUTION: The compound is represented by general formula (b1-9) [wherein R<SP>41</SP>to R<SP>43</SP>are each independently a halogen atom, a halogenated alkyl group, an alkyl group, an acetyl group, an alkoxy group, a carboxy group or a hydroxyalkyl group; R<SP>402</SP>and R<SP>403</SP>are each independently an alkyl group or a halogenated alkyl group; R<SP>404</SP>is an alkyl group or a halogenated alkyl group; R<SP>403</SP>and R<SP>404</SP>may be bonded to each other to form a ring structure; n<SB>0</SB>is an integer of 1-3; n<SB>1</SB>to n<SB>3</SB>are each independently an integer of 0-3; with the proviso that n<SB>0</SB>+n<SB>1</SB>is ≤5; and X<SP>-</SP>is an anion]. <P>COPYRIGHT: (C)2009,JPO&INPIT |
