发明名称 |
LITHOGRAPHIC APPARATUS HAVING ENCODER TYPE POSITION SENSOR SYSTEM |
摘要 |
<P>PROBLEM TO BE SOLVED: To increase the position accuracy of an encoder type sensor system of a lithographic apparatus. <P>SOLUTION: A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target. <P>COPYRIGHT: (C)2009,JPO&INPIT |
申请公布号 |
JP2008294443(A) |
申请公布日期 |
2008.12.04 |
申请号 |
JP20080130322 |
申请日期 |
2008.05.19 |
申请人 |
ASML NETHERLANDS BV |
发明人 |
STEIJAART PETER PAUL;BOX WILHELMUS JOSEPHUS;EUSSEN EMIEL JOZEF MELANIE;LOOPSTRA ERIK R;VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS;CATHARINA MARIA BEERENS RUUD ANTONIUS;SMITS ALBERTUS ADRIANUS |
分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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