发明名称 LITHOGRAPHIC APPARATUS HAVING ENCODER TYPE POSITION SENSOR SYSTEM
摘要 <P>PROBLEM TO BE SOLVED: To increase the position accuracy of an encoder type sensor system of a lithographic apparatus. <P>SOLUTION: A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008294443(A) 申请公布日期 2008.12.04
申请号 JP20080130322 申请日期 2008.05.19
申请人 ASML NETHERLANDS BV 发明人 STEIJAART PETER PAUL;BOX WILHELMUS JOSEPHUS;EUSSEN EMIEL JOZEF MELANIE;LOOPSTRA ERIK R;VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS;CATHARINA MARIA BEERENS RUUD ANTONIUS;SMITS ALBERTUS ADRIANUS
分类号 H01L21/027 主分类号 H01L21/027
代理机构 代理人
主权项
地址