发明名称 MICROSTRUCTURE
摘要 <P>PROBLEM TO BE SOLVED: To provide a microstructure formed simply by using lithography, a method for manufacturing the microstructure, a substrate patterning method using the microstructure, a structure having the microstructure, an information recording medium, a master record, an optical element, an optical communication apparatus, a DNA chip, a light-emitting element, a photoelectric conversion element and an optical lens. <P>SOLUTION: The microstructure contains sulfur compound and silicone oxide. The method for manufacturing the microstructure includes a step of forming a layer containing the sulfur compound, the silicone oxide and a material which can improve the light absorbency on the substrate, a step of radiating a laser beam on the layer formed on the substrate, and a step of etching the layer on which the laser light has been irradiated. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008290227(A) 申请公布日期 2008.12.04
申请号 JP20070276730 申请日期 2007.10.24
申请人 RICOH CO LTD 发明人 MORI TETSUJI
分类号 B82B1/00;B81B1/00;B81C1/00;B82B3/00;G02B1/02;G02B1/11;G02B5/18;G02B5/22;G02B5/30 主分类号 B82B1/00
代理机构 代理人
主权项
地址