| 摘要 |
PROBLEM TO BE SOLVED: To reduce heat radiation from a heating element 4 to a substrate 9 in a chemical vapor deposition apparatus. SOLUTION: The heating element 4 is turned to a wire-like member which is disposed between a first ring 42 on the side of a gas distributor 32 for supplying a raw material gas and a second ring 42 on the side of a substrate holder 5 and generates Joule heat by being energized. By making the heating element 4 not parallel with the substrate 9, the amount of radiation heat reaching the substrate 9 from the heating element 4 is reduced. COPYRIGHT: (C)2009,JPO&INPIT
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