METHOD FOR OPERATING SEMICONDUCTOR MANUFACTURING APPARATUS

摘要

An operating method of a semiconductor manufacturing apparatus are provided to reduce the coating time by coating the particle preventing layer during the latency time of the deposition chamber. An operating method of a semiconductor manufacturing apparatus comprises the following steps: the step for leading the substrate in the chamber(S10); the step for depositing the thin film on the top of the substrate within the chamber(S20); the step for drawing out the substrate on which the thin film is evaporated to the chamber outside(S30); the step for detecting the amount of substrate particle; the step for coating the particle preventing film on the inside of chamber side(S40).