发明名称 NANO-LITHOGRAPHY APPARATUS AND METHOD IN SCANNING PROBE MICROSCOPE
摘要 <p>The lithography apparatus and method of the probe microscope are provided to generate the signal for the nanostructures manufacture in the location which a user wants by outputting the respective digital lithography signal or the analog lithography signal. The lithography apparatus of the probe microscope comprises the information input unit(11), and the output control. The information input unit receives the information for manufacturing the nanostructures to the sample. The information input unit receives the digital or the analog location information of sample. The output control outputs digital produces the respective digital lithography control signal or the analog lithography signal according to the set-up lithography algorithm and the output control outputs digital or the analog location information of the sample selected according to the location information input method of the sample.</p>
申请公布号 KR20080104732(A) 申请公布日期 2008.12.03
申请号 KR20070051927 申请日期 2007.05.29
申请人 IUCF-HYU (INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY) 发明人 LEE, HAI WON;CHUNG, CHUNG CHOO;HAN, CHEOL SU;GWANG, MIN KWON;TAE, GYU LEE
分类号 H01L21/027;G03F7/00 主分类号 H01L21/027
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