发明名称 |
Alignment tool for a lithographic apparatus |
摘要 |
An alignment tool for a lithographic apparatus illuminates an alignment mark on a substrate with an alignment beam and measures the reflected spectrum. The reflected spectrum is compared with a reference mark to determine any misalignment. A blazed sub-wavelength grating is used to deflect the sub-beams created by diffracting the alignment beam from the alignment mark onto the reference mark.
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申请公布号 |
US7460231(B2) |
申请公布日期 |
2008.12.02 |
申请号 |
US20060389494 |
申请日期 |
2006.03.27 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
MUSA SAMI;VAN HAREN RICHARD JOHANNES FRANCISCUS;VAN DER SCHAAR MAURITS |
分类号 |
G01B11/00 |
主分类号 |
G01B11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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