| 摘要 |
<p>A treated substratum provided on its surface with high-contrast hydrophilic region and water-repellent region; and a process for producing a treated substratum by a low-light-intensity short-time operation without the essential need of special apparatus, high-energy rays or long-time light irradiation. There is provided a treated substratum provided on its surface with hydrophilic region and water-repellent region, wherein the water-repellent region consists of a water-repellent film of 0.1 to 100 nm thickness resulting from hardening of composition (A) containing a photopolymerization initiator and compound (a) having at least one (meth)acryloyl group and a water-repellent moiety. Further, there is provided a process for producing a treated substratum, comprising providing a hydrophilic substratum or hydrophilizing a surface of substratum to thereby obtain a hydrophilic surface; forming a film containing the composition (A) on the surface of the substratum; irradiating an area of the surface of the film with light so as to harden the composition (A), thereby producing a water-repellent film of 0.1 to 100 nm thickness; and removing any unhardened composition (A) lying on the surface of the substratum to thereby attain exposure of hydrophilic surface. ® KIPO & WIPO 2009</p> |
