| 摘要 |
The objective of the invention is to provide a semiconductor device manufacturing method that can suppress the formation of voids in the underfill resin and realize a highly reliable flip-chip assembly. The semiconductor device manufacturing method pertaining to the present invention comprises the following processing steps: a step of operation in which a plurality of electrodes 24, formed in a two-dimensional array on a principal surface 22 of semiconductor chip 20, are connected to corresponding conductive regions 32, 34 on substrate 30, a step of operation in which underfill resin 40 is supplied between the principal surface of the semiconductor chip and the substrate, and a step of operation in which the semiconductor chip and substrate with supplied underfill resin 40 are exposed to atmospheric pressure.
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