| 摘要 |
Disclosed is a photosensitive composition comprising a metal particle and/or a particle having a metal, an alkali-soluble resin, an addition-polymerizable monomer having an ethylenically unsaturated double bond, and a photopolymerization initiator, wherein the alkali-soluble resin is a copolymer containing 30 to 90% by mass of a repeat unit B represented by the general formula (1), and having an acid value of 50 mgKOH/g or more and an I/O value of 0.45 to 0.65: (1) wherein R1 represents a hydrogen atom or a methyl group; and R2 represents an alkyl group having 2 to 8 carbon atoms which may have a ring structure or a branched structure. Also disclosed is a material for the formation of a light-shield film for a display device or a photosensitive transfer material using the composition. ® KIPO & WIPO 2009 |
