发明名称 Sensor and lithographic apparatus
摘要 A sensor for use in a lithographic apparatus, the sensor having a liquid to prevent optical losses, especially when receiving radiation with a high NA. The liquid is fixed between two surfaces by capillary forces in an area through which radiation passes.
申请公布号 US7459669(B2) 申请公布日期 2008.12.02
申请号 US20050321466 申请日期 2005.12.30
申请人 ASML NETHERLANDS B.V. 发明人 BASTIAENSEN ROB ADRIANUS ANTONIUS MARIA;HEMERIK MARCEL MAURICE;VAN DE KERKHOF MARCUS ADRIANUS;MERTENS JEROEN JOHANNES SOPHIA MARIA;SONNEVELD JACOB
分类号 G03B27/42;G03F7/20 主分类号 G03B27/42
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