| 发明名称 |
Protection layers in micromirror array devices |
| 摘要 |
To protect the structural layers from being eroded in the etching process, a protection layer is deposited on the exposed structural layers of the micromirror. The protection layer is deposited before etching and removed after etching.
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| 申请公布号 |
US7459402(B2) |
申请公布日期 |
2008.12.02 |
| 申请号 |
US20050135699 |
申请日期 |
2005.05.24 |
| 申请人 |
TEXAS INSTRUMENTS INCORPORATED |
发明人 |
DOAN JONATHAN;PATEL SATYADEV;HEUREUX PETER |
| 分类号 |
H01L21/302;G02B26/08 |
主分类号 |
H01L21/302 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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