| 摘要 |
<p>Disclosed is a negative-type photosensitive fluorinated aromatic resin composition having a low relative permittivity, a low water absorption coefficient, high thermal resistance and high productivity. The composition comprises a fluorinated aromatic prepolymer, a photosensitizing agent and a solvent. The fluorinated aromatic prepolymer can be produced by condensing one or both of a compound (Y-1) having a crosslinkable functional group (A) and a phenolic hydroxyl group and a compound (Y-2) having a crosslinkable functional group (A) and an aromatic ring substituted by a fluorine atom, a fluorinated aromatic compound (B) represented by the formula (1) and a compound (C) having three or more phenolic hydroxyl groups in the presence of a HF-removing agent. (1) wherein n represents an integer of 0 to 3; a and b independently represent an integer of 0 to 3; Rf1 and Rf2 independently represent a fluorinated alkyl group having up to 8 carbon atoms; and F in an aromatic ring means that all of the hydrogen atoms in the aromatic ring are substituted by fluorine atoms. The fluorinated aromatic prepolymer has a crosslinkable functional group (A) and an ether bond, and has a number average molecular weight of 15103 to 55105. ® KIPO & WIPO 2009</p> |
