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发明名称
MATERIAL FOR FORMATION OF RESIST PROTECTION FILM AND METHOD OF FORMING RESIST PATTERN THEREWITH
摘要
申请公布号
KR100870940(B1)
申请公布日期
2008.12.01
申请号
KR20077004557
申请日期
2007.02.26
申请人
发明人
分类号
G03F7/11;G03F7/039;H01L21/027
主分类号
G03F7/11
代理机构
代理人
主权项
地址
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