| 摘要 |
Substrate treating apparatus (100) including support table (103) for not only supporting of treatment object substrate (W) but also heating of the treatment object substrate (W); treatment vessel (101) having the support table (103) disposed therein; and gas supply section (102) for supplying of treating gas into the treatment vessel (101), characterized in that the treating gas contains at least one member selected from among an organic salt, an organic acid amine salt, an organic acid amide and an organic acid hydrazide. ® KIPO & WIPO 2009
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