Nozzle for rinsing substrate with two fluid mixture

摘要

PURPOSE: A nozzle for cleaning a substrate due to two fluid mixture is provided to be capable of easily removing pollutions by noncontact mode and improving uniformity by constantly maintaining the width of a slit. CONSTITUTION: A nozzle(1) is provided with a plurality of pure water supply ports(2) and an air supply port(3). The pure water supply ports(2) further include a sub buffer spacer for distributing uniformly pure water. By using the sub buffer space in the pure water supply ports(2), the pure wafer is uniformly supplied to a mixed buffer space formed in the nozzle(1).