发明名称 LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD AND ANGULAR ENCODER
摘要 <p>Lithographic Apparatus, Device Manufacturing Method and Angular Encoder In a lithographic projection apparatus, a measuring system for measuring the position of the projection system PL relative to a reference frame RF includes sensors rigidly mounted in relation to counterpart sensors of a measuring system measuring the substrate table WT position. An angular encoder which sends light from a target 41 down two optical paths having opposite sensitivities to tilt is used to measure rotation of the projection system PL about its optical axis.</p>
申请公布号 SG147288(A1) 申请公布日期 2008.11.28
申请号 SG20040021929 申请日期 2004.04.22
申请人 ASML NETHERLANDS B.V. 发明人 LEENDERS, MARTINUS HENDRIKUS ANTONIUS;MEIJER, HENDRICUS JOHANNES MARIA;VAN DER PASCH, ENGELBERTUS ANTONIUS;RENKENS, MICHAEL JOZEF MATHIJS;RUIJL, THEO ANJES MARIA
分类号 G03F7/20;H01L21/027 主分类号 G03F7/20
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