发明名称 |
LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD AND ANGULAR ENCODER |
摘要 |
<p>Lithographic Apparatus, Device Manufacturing Method and Angular Encoder In a lithographic projection apparatus, a measuring system for measuring the position of the projection system PL relative to a reference frame RF includes sensors rigidly mounted in relation to counterpart sensors of a measuring system measuring the substrate table WT position. An angular encoder which sends light from a target 41 down two optical paths having opposite sensitivities to tilt is used to measure rotation of the projection system PL about its optical axis.</p> |
申请公布号 |
SG147288(A1) |
申请公布日期 |
2008.11.28 |
申请号 |
SG20040021929 |
申请日期 |
2004.04.22 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
LEENDERS, MARTINUS HENDRIKUS ANTONIUS;MEIJER, HENDRICUS JOHANNES MARIA;VAN DER PASCH, ENGELBERTUS ANTONIUS;RENKENS, MICHAEL JOZEF MATHIJS;RUIJL, THEO ANJES MARIA |
分类号 |
G03F7/20;H01L21/027 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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