PATTERN FORMATION METHOD OF GOLD PATTERN USING GOLD ELECTRON-BEAM RESIST
摘要
<p>A gold pattern formation method using the gold electron-beam resist is provided to form the gold pattern of nano scale using the electron beam writer. A gold pattern formation method using the gold electron-beam resist includes the step for synthesizing the gold electron-beam resist(200); the step for forming the gold electron beam resist film by coating the synthesized gold electron-beam resist on the top of the substrate(220); the step for forming the gold electron beam resist pattern by patterning the gold electron beam resist film using the electron beam writer(260); the step for changing the gold pattern into the gold electron beam resist pattern by applying the thermal treatment to the gold electron beam resist pattern.</p>
申请公布号
KR20080103824(A)
申请公布日期
2008.11.28
申请号
KR20070051050
申请日期
2007.05.25
申请人
ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE