发明名称 PATTERN FORMATION METHOD OF GOLD PATTERN USING GOLD ELECTRON-BEAM RESIST
摘要 <p>A gold pattern formation method using the gold electron-beam resist is provided to form the gold pattern of nano scale using the electron beam writer. A gold pattern formation method using the gold electron-beam resist includes the step for synthesizing the gold electron-beam resist(200); the step for forming the gold electron beam resist film by coating the synthesized gold electron-beam resist on the top of the substrate(220); the step for forming the gold electron beam resist pattern by patterning the gold electron beam resist film using the electron beam writer(260); the step for changing the gold pattern into the gold electron beam resist pattern by applying the thermal treatment to the gold electron beam resist pattern.</p>
申请公布号 KR20080103824(A) 申请公布日期 2008.11.28
申请号 KR20070051050 申请日期 2007.05.25
申请人 ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE 发明人 KIM, KI CHUL;MAENG, SUNG LYUL;KIM, SANG HYEOB
分类号 H01L21/027 主分类号 H01L21/027
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