APPARATUS FOR GENERATING PLASMA

摘要

A plasma generating device is provided to control the capacitance with the antenna unit by moving up/down the electrostatic chuck and installing the antenna unit inside the chamber. A plasma generating device comprises the vacuum chamber(30) in which the top is shut tightly by the vacuum plate(31) having the penetration hole(31a) in center; the electrostatic chuck(34) in which the substrate(33) is placed in the upper side; the antenna unit(36) arranged inside the vacuum chamber which is the bottom surface of the vacuum plate; the antenna cover(37) which is applied about the external source RF(35) and delivered to the antenna unit; the cover holder(37b) supporting the antenna unit. The electrostatic chuck is arranged in the central part of the vacuum chamber. The antenna cover It is exposed by outside through the penetration hole of the vacuum plate.