| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an improved assembly provided with a radiation source, a radiation reflector and a contaminant barrier, particularly, for example, an assembly which can offer improved properties for providing radiation to be employed in EUV lithography. <P>SOLUTION: The contaminant barrier is constructed to receive a radiation from a radiation source and reflect the radiation toward a radiation reflector, and the radiation reflector is constructed to return back the radiation received from the contaminant barrier to reflect toward the contaminant barrier. <P>COPYRIGHT: (C)2009,JPO&INPIT |
