发明名称 PATTERN FILM-FORMING MASK FOR SOLUTION COATING, ITS MANUFACTURING METHOD, PATTERN FILM-MANUFACTURING METHOD, AND MANUFACTURING METHOD OF ORGANIC THIN FILM TRANSISTOR
摘要 PROBLEM TO BE SOLVED: To provide a pattern film-forming mask for solution coating which forms a very precise pattern film. SOLUTION: The pattern film-forming mask for solution coating is provided with a thin board having an aperture part pattern which comprises one or more aperture parts and a plurality of convex structures which are provided on the thin board and are so arranged that they may surround one or more areas including at least one of the aperture parts of the aperture pattern part. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008284459(A) 申请公布日期 2008.11.27
申请号 JP20070131814 申请日期 2007.05.17
申请人 SHARP CORP 发明人 NAKANISHI YASUTETSU;NAKAGAWA MASATOSHI
分类号 B05C21/00;B05C5/00;B05D1/32;H01L21/336;H01L29/786;H01L51/05 主分类号 B05C21/00
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