发明名称
摘要 The present invention relates to a device ( 1 ) for introducing reaction gases into a reaction chamber of an epitaxial reactor; the device ( 1 ) comprises a gas supply pipe ( 2 ) and a cooling member ( 3 ) situated at one end of the supply pipe ( 2 ) and able to cool the supply pipe ( 2 ) and thereby the gas flowing inside it.
申请公布号 JP2008543037(A) 申请公布日期 2008.11.27
申请号 JP20080512827 申请日期 2006.05.23
申请人 发明人
分类号 H01L21/205;C23C16/455 主分类号 H01L21/205
代理机构 代理人
主权项
地址