发明名称 MANUFACTURING METHOD FOR PHOTOPOLYMERIZATION PRODUCT LAYER
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method of a photopolymerization product layer with numerous microrecesses on the surface. SOLUTION: This manufacturing method of a photopolymerization product layer undergoes the following processes: first, a solvent which is non-miscible with a radically polymerizable mixture or its prepolymerization product, is included in a photopolymerizable composition containing a radically polymerizable monomer mixture or its prepolymerization product and a photopolymerization initiator. Then, in this state, the photopolymerizable composition is photopolymerized to obtain a photopolymerization product layer. After that, numerous microrecesses are formed on the surface of the photopolymerization product layer by heating the photopolymerizaton product layer to the temperature level above the boiling point of the non-miscible solvent. It is preferable to include the non-miscible solvent in the photopolymerizable composition at the ratio of not less than 0.1 pts.wt. to not more than 50 pts.wt. to 100 pts.wt. of the radical polymerizable monomer mixture or its prepolymerization product. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008284467(A) 申请公布日期 2008.11.27
申请号 JP20070132325 申请日期 2007.05.18
申请人 NITTO DENKO CORP 发明人 NAGASAKI KUNIO
分类号 B05D7/24;B05D5/06;C09J4/00;C09J4/02;C09J7/02;C09J11/06;C09J201/00 主分类号 B05D7/24
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