IN SITU WAFER HEAT FOR REDUCED BACKSIDE CONTAMINATION,申请号KR20020004641-传众专利搜索

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发明名称	IN SITU WAFER HEAT FOR REDUCED BACKSIDE CONTAMINATION
摘要
申请公布号	KR100870852(B1)	申请公布日期	2008.11.27
申请号	KR20020004641	申请日期	2002.01.26
申请人		发明人
分类号	C23C16/52;H01L21/205;C23C14/02;C23C16/02;H01L21/02;H01L21/302;H01L21/683	主分类号	C23C16/52
代理机构		代理人
主权项
地址

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