| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for checking a positional relation between each of a plurality of exposure masks in a mask holder and a substrate as an exposure object and for easily adjusting the initial position and posture of each of the plurality of exposure masks. <P>SOLUTION: The method includes steps of: photographing a second alignment mark on a substrate W with a CCD camera 6 and setting a position of the CCD camera 6 so as to position the photographed image at a predetermined position on an image of the camera 6; memorizing a position data of the second alignment mark at the set position on the image of the CCD camera 6; comparing the position data of a first alignment mark on the image of the CCD camera 6 obtained by photographing the first alignment mark of a mask 4a with the CCD camera 6, with the position data of the second alignment mark; and adjusting the initial position and posture of the exposure mask 4a so as to minimize a positional shift amount between the first alignment mark and the second alignment mark. <P>COPYRIGHT: (C)2009,JPO&INPIT |
