| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an adjusting method for an exposure apparatus capable of suppressing generation of exposure failure. <P>SOLUTION: In an adjusting method, an exposure apparatus exposing a substrate held by a first holding part is adjusted. The adjusting method includes carrying a predetermined member held by the first holding part out of the first holding part, obtaining temperature information of the predetermined member carried out of the first holding part, and executing an adjusting operation based on the obtained temperature information. <P>COPYRIGHT: (C)2009,JPO&INPIT |
