| 摘要 |
PROBLEM TO BE SOLVED: To provide a mold structure capable of reducing a residual film, excellent in uniformity of a residual film over the entire surface of a substrate, having improved durability and allowing a high-quality pattern to be transferred and formed in a discrete track media and a patterned media, and to provide an imprint method using the mold structure. SOLUTION: The mold structure comprises a disk substrate and a rugged pattern formed on one surface of the substrate by arranging a plurality of projections, wherein a ratio [(Rz/H)×100] of a ten-point average roughness at the top of the projection to the height H of the projection ranges from 10% to 50%. In a preferred form, the ten-point average roughness Rz at the top of the projection is not less than 10 nm. COPYRIGHT: (C)2009,JPO&INPIT
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