发明名称 |
PLASMA GENERATING APPARATUS |
摘要 |
<p>Provided is a plasma generating apparatus. The apparatus includes a vacuum chamber, an ElectroStatic Chuck (ESC), an antenna unit, an antenna cover, and a cover holder. The vacuum chamber has a hollow interior and is sealed at its top by a vacuum plate that has a through-hole at its center. The ESC is disposed at an internal center of the vacuum chamber. The antenna unit is disposed within the vacuum chamber under the vacuum plate. The antenna cover covers and is coupled to a top of the antenna unit and receives and forwards an external source RF to the antenna unit. The cover holder is caught by an upper surface of the vacuum plate and suspends and holds the antenna unit.</p> |
申请公布号 |
WO2008143405(A1) |
申请公布日期 |
2008.11.27 |
申请号 |
WO2008KR02196 |
申请日期 |
2008.04.18 |
申请人 |
JEHARA CORPORATION;KIM, HONG-SEUB;SHIN, HYEON-DONG |
发明人 |
KIM, HONG-SEUB;SHIN, HYEON-DONG |
分类号 |
H01L21/3065;H01L21/208 |
主分类号 |
H01L21/3065 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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