| 发明名称 |
LITHOGRAPHY APPARATUS AND METHOD FOR MANUFACTURING THE APPARATUS |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an immersion-type lithography projection apparatus. <P>SOLUTION: In the immersion-type lithography apparatus, an immersion liquid is confined between a final element of a projection system and a substrate. Both of hydrophobic and hydrophilic layers are used on various elements of the apparatus. The use of them helps to prevent air-bubble formation in the immersion liquid, and reduce residues remained on the elements after immersion in the immersion liquid. <P>COPYRIGHT: (C)2009,JPO&INPIT |
| 申请公布号 |
JP2008288619(A) |
申请公布日期 |
2008.11.27 |
| 申请号 |
JP20080219416 |
申请日期 |
2008.08.28 |
| 申请人 |
ASML NETHERLANDS BV |
发明人 |
STREEFKERK BOB;BASELMANS JOHANNES JACOBUS MATHEUS;BRULS RICHARD JOSEPH;DIERICHS MARCLE MATHIJS T M;DONDERS SJOERD NICOLAAS LAMBERTUS;CHRISTIAAN ALEXANDER HOOGENDAM;JANSEN HANS;LOOPSTRA ERIK ROELOF;JEROEN JOHANNES SOPHIA MARIA MERTENS;MULKENS JOHANNES CATHARINUS HUBERTUS;SENGERS TIMOTHEUS FRANCISCUS;RONALD WALTER JIIN SEVERYNS;SERGEI SHULEPOV;BOOM HERMAN |
| 分类号 |
H01L21/027;B05D3/12;G03F7/20 |
主分类号 |
H01L21/027 |
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