| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive photosensitive composition which has high sensitivity and is improved in edge roughness of a pattern. <P>SOLUTION: The positive photosensitive composition comprises: (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (B) a resin which has a monocyclic or polycyclic alicyclic hydrocarbon structure and decomposes by an action of an acid to increase its solubility in an alkali developer; (C) a basic compound containing a ≥8C substituted or unsubstituted aliphatic hydrocarbon group within a molecule; and a nitrogen-containing basic compound other than the basic compound (C). <P>COPYRIGHT: (C)2009,JPO&INPIT |
