| 摘要 |
A vacuum film forming apparatus is provided that is intended to use a portion of its cylindrical member as a target and moreover have an additional function of plasma polymerization using the cylindrical member. A vacuum film forming apparatus (100) is provided with an electrically conductive vacuum chamber (13) having an interior space, a frame member (15) having a plurality of curved members (31, 32) each curved in a sector shape and arranged in the interior space (10) so as to form a substantially cylindrical shape, and a magnetic field forming device (33) disposed in an interior surrounded by the frame member (15) and configured to form a magnetic field along the circumference of the frame member (15). At least one of the curved members (15, 16) is a target used for sputtering, and a region of the frame member (15) other than the target is used for plasma polymerization.
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