发明名称 |
END POINT DETECTION ELECTRODE SYSTEM AND ETCH STATION |
摘要 |
An end point detection electrode system and an etch station including the electrode system are disclosed. In one embodiment, the electrode system includes: an insulative mount; a first Mu-metal electrode coupled to the insulative mount; and a second Mu-metal electrode coupled to the insulative mount, the second electrode surrounding the first electrode.
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申请公布号 |
US2008289764(A1) |
申请公布日期 |
2008.11.27 |
申请号 |
US20070753650 |
申请日期 |
2007.05.25 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
BERRIDGE ERIK D.;BERRIDGE KIRK G.;BOWNE CAMILLE P.;DROTAR DAVID A. |
分类号 |
C23F1/00 |
主分类号 |
C23F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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