发明名称 END POINT DETECTION ELECTRODE SYSTEM AND ETCH STATION
摘要 An end point detection electrode system and an etch station including the electrode system are disclosed. In one embodiment, the electrode system includes: an insulative mount; a first Mu-metal electrode coupled to the insulative mount; and a second Mu-metal electrode coupled to the insulative mount, the second electrode surrounding the first electrode.
申请公布号 US2008289764(A1) 申请公布日期 2008.11.27
申请号 US20070753650 申请日期 2007.05.25
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 BERRIDGE ERIK D.;BERRIDGE KIRK G.;BOWNE CAMILLE P.;DROTAR DAVID A.
分类号 C23F1/00 主分类号 C23F1/00
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