发明名称 Alumina-film-polishing composition and chemical mechanical polishing method using the same
摘要 An alumina-film-polishing composition is for use in chemical mechanical polishing of an object to be polished that includes an alumina film with an irregular surface, so as to planarize the irregular surface. The polishing composition contains an alumina abrasive grain, and a protection-film-forming agent for forming a protection film on the surface of each of the alumina film and the alumina abrasive grain. The protection-film-forming agent is a water-soluble polymer that has a weight average molecular weight within a range of 100 to 1,000,000 and that is obtained by polymerizing a monomer having at least one OH group or COOH group in its molecule.
申请公布号 US2008293330(A1) 申请公布日期 2008.11.27
申请号 US20080081658 申请日期 2008.04.18
申请人 TDK CORPORATION 发明人 HORI TETSUJI
分类号 B24B7/00;B24B37/00;B24D11/00;C09K3/14;G11B5/31 主分类号 B24B7/00
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