发明名称 GaN SUBSTRATE, AND EPITAXIAL SUBSTRATE AND SEMICONDUCTOR LIGHT-EMITTING ELEMENT USING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a GaN substrate capable of improving the light-emitting efficiency of a semiconductor light-emitting element, an epitaxial substrate using it and a semiconductor light-emitting element. <P>SOLUTION: The GaN substrate 30 has a growth plane 30a having an off angle against m plane or a plane. The growth plane 30a of the GaN substrate is m plane or a plane having an off angle. When a semiconductor light-emitting element is manufactured by using the GaN substrate 30, a high light-emitting efficiency is achieved by avoiding an influence of piezoelectric field because these m plane and a plane are nonpolar planes. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008285364(A) 申请公布日期 2008.11.27
申请号 JP20070132035 申请日期 2007.05.17
申请人 SUMITOMO ELECTRIC IND LTD 发明人 AKITA KATSUSHI
分类号 C30B29/38;H01L21/205;H01L33/16;H01L33/32 主分类号 C30B29/38
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