发明名称 |
GaN SUBSTRATE, AND EPITAXIAL SUBSTRATE AND SEMICONDUCTOR LIGHT-EMITTING ELEMENT USING THE SAME |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a GaN substrate capable of improving the light-emitting efficiency of a semiconductor light-emitting element, an epitaxial substrate using it and a semiconductor light-emitting element. <P>SOLUTION: The GaN substrate 30 has a growth plane 30a having an off angle against m plane or a plane. The growth plane 30a of the GaN substrate is m plane or a plane having an off angle. When a semiconductor light-emitting element is manufactured by using the GaN substrate 30, a high light-emitting efficiency is achieved by avoiding an influence of piezoelectric field because these m plane and a plane are nonpolar planes. <P>COPYRIGHT: (C)2009,JPO&INPIT |
申请公布号 |
JP2008285364(A) |
申请公布日期 |
2008.11.27 |
申请号 |
JP20070132035 |
申请日期 |
2007.05.17 |
申请人 |
SUMITOMO ELECTRIC IND LTD |
发明人 |
AKITA KATSUSHI |
分类号 |
C30B29/38;H01L21/205;H01L33/16;H01L33/32 |
主分类号 |
C30B29/38 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|