MASK PATTERN DATA GENERATION METHOD, INFORMATION PROCESSING APPARATUS, PHOTOMASK FABRICATION SYSTEM, AND IMAGING DEVICE

摘要

PROBLEM TO BE SOLVED: To prevent dot pattern symmetry from degrading. SOLUTION: A method for generating mask pattern data of a photomask used to form microlenses 1003 includes: dividing the pattern formation surface of a mask pattern to be formed on the photomask into a plurality of grid cells and acquiring data which represents transmitted light distribution of the mask pattern to be formed on the photomask (S10 to S12); determining whether or not to place a shield on each of the plurality of grid cells by binarizing the plurality of grid cells in order of increasing or decreasing distance from the center of the pattern formation surface using an error diffusion method to acquire the transmitted light distribution (S13); and generating mask pattern data where the plurality of shields are arranged according to results from the determining process (S14). COPYRIGHT: (C)2009,JPO&INPIT