| 摘要 |
PROBLEM TO BE SOLVED: To provide a sample preparing method for analyzing, observing, and measuring a minute region by separating, or separating and preparing a minute sample including a desired specific region from the sample, such as an electronic component of a semiconductor wafer and a device, without inclining a sample stage, and to provide a sample preparing apparatus. SOLUTION: In the sample preparing method, focusing ion beams are applied to the sample at an irradiation angle of less than 90°at the maximum to the sample surface, the periphery of a target fine sample is removed, the sample stage is rotated with a vertical segment to the sample surface as a rotary axis, the irradiation angle of the focusing ion beams to the sample surface is fixed and the ion beams are applied to the sample, and the minute sample is separated or separated and prepared. COPYRIGHT: (C)2009,JPO&INPIT
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