<p>Provided is a polishing pad manufacturing method which eliminates slurry leakage and has excellent optical detection accuracy. The polishing pad manufacturing method includes a step of forming a groove for injecting a light transmissive region forming material on the polishing rear side of a polishing layer; a step of forming a light transmissive region by injecting the light transmissive region forming material into the groove and hardening the material; and a step of exposing the light transmissive region from a polishing front surface by buffing the polishing front side of the polishing layer.</p>
