摘要 |
<p>Disclosed is an integrated vacuum producing apparatus, which vacuumizes a process chamber of an apparatus for manufacturing semiconductors, flat panel displays, etc. or exhausts gaseous material and by-products generated within the process chamber to an outside so as to purify it. Gaseous material, e.g. gas, generated within a chamber for manufacturing a semiconductor, a flat panel display, etc. is exhausted through each separate exhaust line so as to be purified. Therefore, excessive operation of a purifying system can be prevented through distribution of exhaust gas so that life span can be extended according to the operation of the apparatus. Also, exhausting can be smoothly achieved through each exhaust line so that it is possible to prevent delay of a semi-conductor manufacturing process due to inability of exhausting, and to easily remove non- reacted gas and by-products in an exhausting process.</p> |
申请人 |
LOT VACUUM CO., LTD.;HWANG, TAE-KYONG;OH, HEAUNG-SHIG;NOH, MYUNG-KEUN |
发明人 |
HWANG, TAE-KYONG;OH, HEAUNG-SHIG;NOH, MYUNG-KEUN |