摘要 |
The application relates to an optical device for enhancing the stress to be generated in a substrate in comparison with a conventional technique. To this end, the optical device includes a substrate having a photoelastic effect, a first stress layer formed on a first face of the substrate and having a pattern for generating stress which induces refraction index variation by the photoelastic effect in a partial region in the substrate, and a second stress layer formed on a second face which is a reverse face to the first face of the substrate and configured to generate stress for restoring the shape from the deformation caused by the stress generated in the substrate by the first stress layer in the substrate.
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