| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for rapid thermal annealing. SOLUTION: A method for rapid thermal annealing is disclosed. When a substrate is inserted into an annealing chamber, heating starts by heat radiated from chamber components that have been heated when a previous substrate has been annealed. Thus, while the substrate is inserted, the tip of the substrate may have a raised temperature while the rear edge may have room temperature, thus causing a temperature gradient to be generated across the substrate. Even if the substrate is completely inserted in the annealing chamber, the temperature gradient may be generated. By compensating for the temperature gradient across the substrate, the substrate can be annealed uniformly. COPYRIGHT: (C)2009,JPO&INPIT |
