Rework process for photoresist film,申请号EP20060255764-传众专利搜索

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发明名称	Rework process for photoresist film
摘要
申请公布号	EP1788437(A3)	申请公布日期	2008.11.26
申请号	EP20060255764	申请日期	2006.11.09
申请人	SHINETSU CHEMICAL CO., LTD.	发明人	OGIHARA, TSUTOMU;UEDA, TAKAFUMI
分类号	G03F7/09;G03F7/11;G03F7/40;G03F7/42;H01L21/027	主分类号	G03F7/09
代理机构		代理人
主权项
地址

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