发明名称 |
METHOD OF SEASONING FILM-FORMING APPARATUS |
摘要 |
A seasoning method for a film-forming apparatus configured to form a silicon nitride film on a substrate placed in a process chamber. The method is conducted for reducing particles in the apparatus. The method comprises executing the plasma cleaning of the process chamber to remove a film deposited on the inner wall thereof (step S1), subsequently depositing an amorphous silicon film (step S2), depositing thereon a silicon nitride film in which the nitrogen content gradually increases in the thickness direction (step S3), and keeping the inside of the process chamber being filled with a rare-gas plasma until film formation on the substrate is initiated (step S4).
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申请公布号 |
EP1995770(A1) |
申请公布日期 |
2008.11.26 |
申请号 |
EP20070714447 |
申请日期 |
2007.02.19 |
申请人 |
MITSUBISHI HEAVY INDUSTRIES, LTD. |
发明人 |
SHIMAZU, TADASHI;KAWANO, YUICHIC |
分类号 |
H01L21/205;C23C16/44 |
主分类号 |
H01L21/205 |
代理机构 |
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地址 |
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