| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pollutant gas removal material and a gaseous pollutant removal method using the pollutant gas removal material for economical semiconductor manufacturing equipment with easy maintenance, capable of semipermanently removing a gaseous pollutant including ammonia or organic gas or the like in a local space of the semiconductor manufacturing equipment. <P>SOLUTION: The pollutant gas removal material having at least the basic gas adsorption capability and the photocatalysis (for example; the pollutant gas removal material containing a titanium-based compound oxide including a double oxide of titanium and silicon or the like) is used. The pollutant gas removal material is installed in the semiconductor manufacturing equipment so as to remove the gaseous pollutant. <P>COPYRIGHT: (C)2004,JPO |
