| 摘要 |
To provide a negative photosensitive fluorinated aromatic resin composition having a low relative permittivity, low water absorptivity, high heat resistance and high productivity. A negative photosensitive fluorinated aromatic resin composition comprising the following fluorinated aromatic prepolymer, a photosensitizer and a solvent. Here the fluorinated aromatic prepolymer is a fluorinated aromatic prepolymer which is obtained by subjecting either one or both of a compound (Y-1) having a crosslinkable functional group (A) and a phenolic hydroxyl group, and a compound (Y-2) having a crosslinkable functional group (A) and a fluorinated aromatic ring, to a condensation reaction in the presence of a HF-removing agent, with a fluorinated aromatic compound (B) represented by the following formula (1) :
(wherein n is an integer of from 0 to 3, each of a and b which are independent of each other, is an integer of from 0 to 3, each of Rf 1 and Rf 2 is a fluorinated alkyl group having at most 8 carbon atoms, and F in the aromatic ring represents that hydrogen atoms of the aromatic ring are all substituted by fluorine atoms), and a compound (C) having at least 3 phenolic hydroxyl groups, and which has crosslinkable functional groups (A) and ether bonds and has a number average molecular weight of from 1×10 3 to 5×10 5 . |
