| 摘要 |
<p>A dipping lithographic method is provided to suppress the focus shift due to the thermal wake effect in the dipping lithography process. A dipping lithographic method includes the step that especially successively exposes on trial the exposure field by equipping the test wafer to the dipping lithography equipment; the step of obtaining the temperature change distribution per each exposure field by sensing the temperature of the test wafer(610) using the thermal sensor(655); the step of extracting the cooling temperature distribution; the step of mounting the processing wafer to the dipping lithography equipment; the step of cooling the processing wafer according to the exposure field.</p> |
