发明名称 Self-releasing spring structures and methods
摘要 According to various exemplary embodiments, a spring device that includes a substrate, a self-releasing layer provided over the substrate and a stressed-metal layer provided over the self-releasing layer is disclosed, wherein an amount of stress inside the stressed-metal layer results in a peeling force that is higher than an adhesion force between the self-releasing layer and the stressed-metal layer. Moreover, a method of manufacturing a spring device, according to various exemplary embodiments, includes providing a substrate, providing a self-releasing layer over the substrate and providing a stressed-metal layer over the self-releasing layer wherein an amount of stress inside the stressed-metal layer results in a peeling force that is higher than an adhesion force between the self-releasing layer and the stressed-metal layer is also disclosed in this invention.
申请公布号 US7456092(B2) 申请公布日期 2008.11.25
申请号 US20040959180 申请日期 2004.10.07
申请人 PALO ALTO RESEARCH CENTER INCORPORATED 发明人 HANTSCHEL THOMAS;KOSGALWIES SVEN;FORK DAVID K.;CHOW EUGENE M.
分类号 H01L21/4763 主分类号 H01L21/4763
代理机构 代理人
主权项
地址