| 发明名称 |
Optical element fabrication method, optical element, exposure apparatus, device fabrication method |
| 摘要 |
There is to provide an optical element fabrication method including the steps of forming a thin film onto a substrate, and eliminating a color center produced in the forming step by giving energy to the substrate.
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| 申请公布号 |
US7455880(B2) |
申请公布日期 |
2008.11.25 |
| 申请号 |
US20050212574 |
申请日期 |
2005.08.29 |
| 申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
BIRO RYUJI;OTANI MINORU |
| 分类号 |
B05D5/00;G02B5/18;C03C17/00;C03C23/00;C23C14/58;C30B33/00;G02B1/10;G02B1/11;G02B3/00;G03F7/20 |
主分类号 |
B05D5/00 |
| 代理机构 |
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代理人 |
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