发明名称 |
Patterning process and resist overcoat material |
摘要 |
In an immersion lithography process, a pattern is formed by forming a photoresist layer on a wafer, forming a protective coating on the photoresist layer from a resist overcoat material, exposing the layer structure to light in water, and developing. A water-insoluble, alkali-soluble material is used as the resist overcoat material.
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申请公布号 |
US7455952(B2) |
申请公布日期 |
2008.11.25 |
申请号 |
US20050105510 |
申请日期 |
2005.04.14 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
HATAKEYAMA JUN;HARADA YUJI |
分类号 |
G03F7/00;C08F2/00;C08F12/30;G03F7/004;G03F7/11;G03F7/20 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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